The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 1996
Filed:
Apr. 03, 1995
Takeshi Kagamida, Mitaka, JP;
Tokyo Seimitsu Co., Ltd., Mitaka, JP;
Abstract
It is an object of the present invention to provide an apparatus and a method for manufacturing a wafer, which are the most suitable for meeting the requirement for the mirror grinding surface of the wafer's chamfering portion. As a result, when the ingot is sliced, a wafer being sliced is chamfered at the same time. And, it is also possible that before the ingot starts to be sliced by the blade, the grindstone is pressed against the outer periphery of the slicing position to form a V-shaped groove along the outer periphery of the slicing position, so that the chamfering can be performed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile