The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1996
Filed:
Dec. 13, 1994
Applicant:
Inventors:
Rumiko Hayase, Kawasaki, JP;
Yasunobu Onishi, Yokohama, JP;
Hirokazu Niki, Yokohama, JP;
Noahiko Oyasato, Kawaguchi, JP;
Yoshihito Kobayashi, Kawasaki, JP;
Shuzi Nayase, Kawasaki, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
430326 ; 430165 ; 430166 ; 430176 ; 430191 ; 430192 ; 430193 ; 4302701 ; 4302731 ; 430330 ;
Abstract
Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.