The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1996
Filed:
Jun. 16, 1994
Applicant:
Inventors:
Water Lur, Taipei, TW;
Po-Wen Yen, Hsin-Chu City, TW;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
430316 ; 430317 ; 430950 ; 437229 ; 15665911 ; 15666111 ; 1566621 ;
Abstract
A method is disclosed which eliminates standing waves in the photoresist layer of VLSI devices. A layer of anti-reflecting material is deposited between the photoresist and its underlying poly layer. This anti-reflecting layer is formed with an appropriate thickness and index of refraction so that none of the lithographic light incident on the photoresist is reflected back from the underlying layer. This eliminates the interference between incident and reflected light in the photoresist, thus preventing the occurrence of standing waves.
Lur, Water. (1996). Process for elimination of standing wave effect of photoresist (U.S. Patent No. 5580701). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5580701
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile