The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 1996
Filed:
Apr. 29, 1994
Takeo Maeda, Tokyo, JP;
Hiroshi Gojohbori, Yokohama, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A semiconductor integrated circuit device having a bipolar transistor and contact in the form of a wired layer by using different impurities for doping the emitter electrode and the wired layer of the device, both of which are made of polysilicon. The emitter electrode, formed on an emitter region of a p-type silicon semiconductor substrate, is doped with an n-type impurity having a low diffusion coefficient. A polysilicon wired layer, formed on an impurity diffusion region in an active region of the semiconductor substrate, is doped with another impurity that can effectively destroy native oxide films. With such an arrangement of selectively using impurities, the temperature of thermally treating the emitter region can be less than 850.degree. C.