The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 1996
Filed:
Nov. 30, 1994
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A substrate comprising a supporting member and a treated article provided on the supporting member comprising: 1) a patterned resistor layer; 2) a patterned material provided on the patterned resistor layer comprising at least aluminum; 3) a silicon compound film provided on both the patterned resistor layer and the patterned material; and 4) a multi-layered wiring provided on the article comprising as constituents at least a conductive layer comprising at least aluminum and electrically connected to the patterned material. The substrate includes substrates for integrated circuits, circuit boards, and ink jet recording heads. A method for etching a silicon compound film comprises etching the silicon compound film in a gas flow rate ratio of CHF.sub.3 to C.sub.2 F.sub.6 of 1 to 6 under an etching pressure of 40 to 120 Pa.