The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 1996
Filed:
Sep. 01, 1994
Applicant:
Inventor:
Shih-Ming Wang, Kaohsiung, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company Ltd., Hsin-Chu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437195 ; 437231 ; 437238 ; 437978 ; 216 38 ;
Abstract
A method is described for eliminating problems of adhesion, including peeling and blistering, between the surface of a cured spin- on-glass layer and a second deposited layer of a different material. After curing, and prior to the deposition of the second layer, the layer of spin-on-glass is subjected to a short heat treatment in vacuum. The second layer is then deposited without breaking the vacuum.
Wang, Shih-Ming. (1996). Method for improving adhesion to a spin-on-glass (U.S. Patent No. 5554567). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5554567
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile