The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 1996
Filed:
May. 22, 1995
Tadashi Nagayama, Ota-ku, JP;
Nikon Corporation, , JP;
Abstract
An illumination optical system and an alignment apparatus suitable for reticle alignment in the projection exposure apparatus. There is provided an illumination optical system having parallel beam supply means for supplying a parallel beam and a light guide for guiding the parallel beam from the parallel beam supply means to a target illumination object, comprising diffusion means, arranged between the parallel beam supply means and the light guide, for diffusing the parallel beam, wherein an incident end face of the light guide is arranged to be inclined by a predetermined angle with respect to a plane perpendicular to a direction of incidence of the parallel beam onto the diffusion means.