The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 1996
Filed:
Apr. 01, 1991
Applicant:
Inventors:
Whitson G Waldo, III, Poughkeepsie, NY (US);
Matthew A Thompson, Fishkill, NY (US);
Assignee:
Motorola, Schaumburg, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430 22 ; 430313 ; 430323 ; 430396 ;
Abstract
A method of patterning an X-ray master mask (21) is described by using reduction projection. An X-ray mask (21) is provided with a photoactive material coating a plating base layer (24). The X-ray mask (21) is positioned under the reduction projection tool. The photoactive material on the X-ray mask (21) is exposed from a pattern (13) in the reduction projection tool.
Waldo, III, Whitson. (1996). Method for patterning an x-ray master mask (U.S. Patent No. 5552247). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5552247
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile