The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 1996
Filed:
Mar. 01, 1995
Kazuhiro Yoshida, Kasugai, JP;
Noriaki Sato, Kasugai, JP;
Fujitsu Ltd., Kanagawa, JP;
Fujitsu VLSI Ltd., Aichi, JP;
Abstract
A CAD system designs mask patterns for use in a master slice integrated circuit processing. The system includes an input device such as a mouse interface, and a display unit for symbolically displaying circuit elements and cells. A first data base stores a net list of circuit design information. A second data base stores data relating to the structure of a master slice bulk and various types of elemental cells formed in the master slice. A processing unit of the CAD system causes the display unit to display both a circuit design scheme and the master slice bulk on a screen of the display unit. The processing unit produces data about the initial positions of a pair of contact hole patterns by which a resistor is defined in a resistive cell region of the master slice, and automatically shifts the contact hole patterns from the initial positions to another position, in order to avoid interference between a wiring pattern on the master slice bulk and the contact hole patterns.