The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 1996
Filed:
Mar. 04, 1994
Applicant:
Inventors:
Woo-sung Han, Suwon, KR;
Chang-jin Sohn, Kwangmyeong, KR;
Assignee:
Samsung Electronic Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430322 ; 430396 ; 430323 ; 430324 ;
Abstract
A mask and a method for manufacturing the same, which can form a correct pattern on a semiconductor wafer having steps, includes a mask substrate having steps oppositely corresponding to steps on said semiconductor wafer and an opaque mask pattern for cutting off light from the mask substrate to thereby enable the same exposure focus to be provided to the step and non-step regions on the semiconductor wafer. Further, a clean and correct pattern can be formed by controlling the amount of exposure irradiated onto the step and non-step regions on the semiconductor wafer.