The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 1996
Filed:
May. 09, 1994
Yasuji Yamada, Tokyo, JP;
Minoru Tagami, Funabashi, JP;
Masaru Nakamura, Mitaka, JP;
Hideki Sakai, Urawa, JP;
Koichi Uehara, Tokyo, JP;
Yuh Shiohara, Chigasaki, JP;
Shoji Tanaka, Tokyo, JP;
International Superconductivity Technology Center, all of, JP;
Mitsubishi Cable Industries, Ltd., all of, JP;
Kyocera Corporation, all of, JP;
Japan Energy Corporation, all of, JP;
Abstract
A composite material comprising a bulky substrate of a Y-series 123 metal oxide crystal, and at least one layer provided on a surface of the substrate and formed of a crystal of a Y-series 123 metal oxide. The substrate may be produced by immersing a seed material in a liquid phase which comprises components constituting the metal oxide. The liquid phase contains a solid phase located at a position different from the position at which the seed material contacts the liquid phase. The solid phase provides the liquid phase with solutes which constitute the Y-series 123 metal oxide so that the solutes are transported to the position at which the seed material and the liquid phase contact, thereby permitting the Y-series 123 metal oxide to grow on the seed material as primary crystals and to obtain the bulky substrate. The layer of a Y-series 123 metal oxide may be formed on the substrate by a sputtering method, a vacuum deposition method, a laser abrasion method, a CVD method or a liquid phase epitaxy method.