The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 1996
Filed:
Feb. 09, 1994
Applicant:
Inventors:
Koichi Teshima, Tokyo, JP;
Yoshinori Fujimori, Tokyo, JP;
Shin-ichi Nakamura, Yokohama, JP;
Masayuki Fukuda, Yokohama, JP;
Michihiko Inaba, Yokohama, JP;
Emiko Higashinakagawa, Kawasaki, JP;
Yasuhisa Ohtake, Fukaya, JP;
Eiichi Akiyoshi, Hyogo-ken, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-4 ; 430 23 ; 430 36 ; 430323 ;
Abstract
Disclosed is a shadow mask plate material which consists of an Fe-Ni-based alloy containing iron and nickel as main constituents, has an unrecrystallized texture with a grain size of 10 .mu.m or less, and is excellent in etching characteristics for forming electron beam apertures.