The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 1996
Filed:
Dec. 13, 1994
Takasuke Hashimoto, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A semiconductor device includes an n-type low-resistance region (2) formed on a p-type monocrystalline semiconductor substrate (1), an n-type epitaxial layer (3) formed on the n-type low-resistance region (2), an insulating film (5) formed on the n-type epitaxial layer (3) and having a first opening selectively formed therein, and an n-type polysilicon film (8) having an overhung portion extending from the entire peripheral portion of the opening to the inside of the opening. An n-type polysilicon film (9) is formed downward from the bottom surface of the overhung portion, and a p-type monocrystalline silicon film (6) serving as a base is formed on the surface of the n-type epitaxial layer in the first opening. The base (6) is in contact with the n-type polysilicon films (8, 9), and the n-type emitter (10) is formed immediately below the n-type emitter polysilicon films (8, 9) to have an annular shape.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile