The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 1996
Filed:
Dec. 30, 1994
Applicant:
Inventors:
M Dalil Rahman, Flemington, NJ (US);
Daniel P Aubin, Oxford, NJ (US);
Dinesh N Khanna, Flemington, NJ (US);
Douglas McKenzie, Easton, PA (US);
Assignee:
Hoechst Celanese Corporation, Somerville, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ; B01J / ; C08G / ;
U.S. Cl.
CPC ...
4302701 ; 430311 ; 430905 ; 430188 ; 210660 ; 210681 ; 210688 ; 528129 ; 437229 ;
Abstract
The present invention provides methods for producing water insoluble, aqueous alkali soluble, film forming novolak resins having an extremely low level of metal ions, utilizing treated anion and cation exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resin and for producing semiconductor devices using such photoresist compositions.