Positioning method and apparatus

Abstract

A positioning method involving the following steps is disclosed. Measured are coordinates positions of at least three preselected exposure areas on a static coordinate system among a plurality of exposure areas two-dimensionally formed in accordance with predetermined array coordinates on a photosensitive substrate. Calculative array coordinates of the plurality of exposure areas on the static coordinate system are calculated by using a plurality of first parameters calculated by statistically calculating the plurality of measured coordinate positions. Then, the photosensitive substrate is positioned in an exposure position while being moved in accordance with the calculative array coordinates thus calculated. Specific marks formed on a mask are thus exposed on each of a plurality of predetermined positions on the photosensitive substrate. Measured further are coordinate positions of latent images of at least three specific marks on the static coordinate system among images (latent images) of a plurality of specific marks exposed. The plurality of these measured coordinate positions are statistically calculated, thereby calculating a plurality of second parameters used for obtaining coordinate positions of each of the plurality of specific marks (latent images) on the static coordinate system. Next, each of the plurality of exposure areas on the photosensitive substrate is aligned with an exposure position in accordance with a deviation between the parameter representing an array offset among the plurality of first parameters and the parameter representing an array offset among the plurality of second parameters. Besides, particularly the specific marks of the mask are exposed within a non-exposure domain (where no base pattern is formed) in the vicinity of the outer periphery of the photosensitive substrate.