The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 1996

Filed:

Apr. 18, 1995
Applicant:
Inventor:

Lance G Hellwig, Jennings, MO (US);

Assignee:

MEMC Electronic Materials, Inc., St. Peters, MO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118728 ; 118715 ; 118725 ; 118730 ;
Abstract

A susceptor for holding semiconductor wafers in a barrel reactor for chemical vapor deposition of material on the wafers having a baffle for reducing the amount of material deposited at the bottom of the lowest wafers held in the susceptor. The baffle includes a plate mounted on the bottom of the susceptor and a deflector for each wall of the susceptor. The deflectors each have the shape of a chordal section of a cylinder and are mounted on the plate against a respective wall of the susceptor below the lowest wafer-holding recess on that wall of the susceptor.

Published as:
TW269047B; US5518549A; EP0738789A2; KR960039129A; JPH08325093A; EP0738789A3; CN1158492A; SG73979A1;

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