The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 1996

Filed:

Nov. 03, 1993
Applicant:
Inventors:

Hideo Kaneko, Kanagawa, JP;

Katsushi Tokunaga, Osaka, JP;

Yoshio Tawara, Kanagawa, JP;

Yoshiaki Shimizu, Kanagawa, JP;

Tadao Nomura, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ; B32B / ; G11B / ;
U.S. Cl.
CPC ...
428332 ; 428 643 ; 428336 ; 4286 / ; 4286 / ; 4286 / ; 4286 / ; 4286 / ; 428900 ; 360131 ; 360135 ; 365122 ; 369 13 ; 369 14 ;
Abstract

A magneto-optical recording medium having a layered structure consisting of a first dielectric layer, magnetic recording layer, second dielectric layer and reflecting layer successively formed on a transparent substrate plate can be imparted with improved performance relative to the recording sensitivity and the C/N ratio when the recording layer and the second dielectric layer each have such a thickness that the angle .delta. given by the equation .delta.=tan.sup.-1 (.epsilon./.theta.k), in which .epsilon. is the Kerr ellipticity of the regenerative light and .theta.k is the Kerr rotation angle, does not exceed 10.degree., the thickness of the recording layer being in the range from 8 nm to 13.5 nm and the thickness of the second dielectric layer satisfying the relationship given by the inequality


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