The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 1996
Filed:
Feb. 17, 1995
Applicant:
Inventor:
Alek C Chen, Mount Kisco, NY (US);
Assignee:
Loral Federal Systems Company, McLean, VA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378 35 ;
Abstract
In 1-X proximity X-ray lithography involving an X-ray mask having a ring, a rectangular membrane formed in a mask element, and a design pattern defined on the membrane, mechanical devices are provided to produce torque in the ring and, thereby, stretch or shrink the membrane and the design pattern. The mechanical devices are arranged on axes intersecting one another and extending diagonally through the corners of the membrane, as well as on axes which bisect angles formed by the intersection of the corner axes.