The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 1996
Filed:
Dec. 08, 1994
Hideo Kudo, Fukushima, JP;
Isao Uchiyama, Fukushima, JP;
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Abstract
A wafer cleaning tank including a tank body containing therein a cleaning solution, and wafer supporting device for substantially vertically supporting at least one wafer in the tank body, wherein the wafer supporting device includes a pair of confronting fixed wafer support members disposed in the tank body with a predetermined space therebetween and each having at least one side wafer-supporting portion, and a movable wafer support member vertically movably disposed centrally between the fixed wafer support members at a level below the fixed wafer support members and having at least one central wafer-supporting portion corresponding in position to the position of the side wafer-supporting portion of each of the fixed wafer support members, and wherein the side wafer-supporting portions and the central wafer-supporting portion jointly form a three-point support structure which supports the wafer at three points on the outer edge thereof. The wafer cleaning tank thus constructed is capable of cleaning a plurality of wafers at one time and well adaptable to the cleaning of wafers of different diameters.