The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 1996
Filed:
Feb. 13, 1995
George Wong, Singapore, SG;
Chartered Semiconductor Manufacturing, Singapore, SG;
Abstract
A method, and resultant structure, for manufacturing large highly reflective metal reflector plates on an integrated circuit chip, for applications in game chips or similar virtual image projection systems, is described. A metal interconnection layer is formed above a semiconductor substrate, an intermetal dielectric layer is formed on the metal interconnection layer, and an opening is made through the intermetal dielectric layer to expose a portion of the metal interconnection layer. A first metal layer is formed on the intermetal dielectric layer and connecting to the metal interconnection layer through the opening. A second metal layer is formed on the first metal layer. A third metal layer is formed on the second metal layer. A highly reflective metal layer is formed on the third metal layer. The the first, second, third and highly reflective metal layers are patterned to form the highly reflective metal reflector plate. A passivation layer is formed over the highly reflective metal reflector plate and exposed surface of the intermetal dielectric layer. The passivation layer is etched above the highly reflective metal reflector plate to leave a portion of the passivation layer over the entire top surface of the highly reflective metal reflector plate. The portion of the passivation layer is removed with a wet etch, to expose the highly reflective metal reflector plate.