The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 1996
Filed:
Apr. 26, 1994
Applicant:
Inventors:
Susumu Sawada, Tokyo, JP;
Junichi Anan, Kitaibaraki, JP;
Hiroki Nakamura, Tokyo, JP;
Yoshihiro Sakaya, Tokyo, JP;
Assignee:
Japan Energy Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
20429812 ; 20419213 ; 20429803 ;
Abstract
A sputtering target is provided in which a gas component source (material capable of evolving gas) is included in the bottom portion of the target. Predicting and determining the expiration of the useful life of sputtering targets is permitted more precisely and in a simpler way than heretofore described. Moreover over-sputtering is prevented with an improvement in target use efficiency.