The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 1995
Filed:
Sep. 12, 1994
Takashi Yamanobe, Kanagawa, JP;
Michio Satou, Kanagawa, JP;
Takashi Ishigami, Kanagawa, JP;
Minoru Obata, Tokyo, JP;
Mituo Kawai, Kanagawa, JP;
Noriaki Yagi, Kanagawa, JP;
Toshihiro Maki, Kanagawa, JP;
Shigeru Ando, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Kanagawa, JP;
Abstract
A sputtering target that consists essentially of a continuous matrix of Ti-W phase, Ti phase having a particle diameter of 50 .mu.m or less distributed in the matrix, and a W phase having a particle diameter of 20 .mu.m or less also distributed in the matrix. Preferably the target contains aluminum in the range of 1 ppm or less. The target has high density and a low impurity content, which reduces the generation of particles from the target when it is used for sputtering. A method of manufacturing the sputtering target is also disclosed.