The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1995
Filed:
Sep. 21, 1994
Mohamad T Krounbi, San Jose, CA (US);
Kenneth T Kung, San Jose, CA (US);
Ching H Tsang, Sunnyvale, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A magnetoresistive (MR) read transducer assembly having passive end regions separated by a central active region, and a method of fabricating it. Layers of a first biasing material and a nonmagnetic decoupling spacer material are deposited on a substrate, then covered by a mask only in the central region. By etching or ion milling, those parts of the layers not covered by the mask are removed to define a transverse biasing means in the central region and define the passive end regions. With the same mask remaining in place, a conductive material and exchange layer comprising a second biasing material are deposited over all regions. The mask is removed to define and provide conductor leads and longitudinal biasing means only in the end regions. MR material is thereafter deposited as a continuous thin film in direct contact with the central region containing the transverse biasing means and in direct contact with the end regions containing the longitudinal biasing means. This fabrication technique has no critical etching steps requiring stopping at or near a particular interface and the MR film provides a continuous platform for carrying current without butted junctions in the current path.