The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 1995

Filed:

Dec. 20, 1993
Applicant:
Inventors:

Paul D Jackson, Scottsdale, AZ (US);

Stephen C Schultz, Gilbert, AZ (US);

James E Sanford, Mesa, AZ (US);

Glen Ong, Tempe, AZ (US);

Richard B Rice, Chandler, AZ (US);

Parag S Modi, Phoenix, AZ (US);

John G Baca, Tempe, AZ (US);

Assignee:

Westech Systems, Inc., Phoenix, AZ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ; B24B / ;
U.S. Cl.
CPC ...
451 11 ; 451 56 ; 451 57 ; 451 63 ; 451 67 ;
Abstract

An axially rotating circular polishing pad is conditioned by a rotating end effector that has an abrasion disc in contact with a polishing surface of the pad. The end effector moves along a radius of the polishing pad surface at a velocity that varies to compensate for locations on the polishing pad surface having linear velocities that are directly related to their respective radii. A desired contact force is maintained between the end effector and the polishing pad surface.


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