The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 1995
Filed:
Apr. 28, 1993
Applicant:
Inventors:
Martin P Lepselter, Summit, NJ (US);
Sheldon M Kugelmass, Teaneck, NJ (US);
Assignee:
Lepton, Inc., Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
25049223 ; 25049222 ; 2503 / ;
Abstract
An apparatus for exposing a radiation sensitive workpiece to define patterns therein includes an electron gun, a mask with spaced apertures for passing electron radiation, and a radiation deflector-blanker to direct the radiation to selected ones of the apertures and to form separate beamlets from the apertures then demagnify the separate beamlets and direct them onto the workpiece without crossing them. In one embodiment, the groups of apertures are fixed on the mask and define fixed undivided profiles in the path of the radiation.