The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 1995

Filed:

Apr. 12, 1993
Applicant:
Inventors:

Frank G Pensavecchia, Hudson, NH (US);

John F Kline, Londonderry, NH (US);

Stephen M LaPonsey, Merrimack, NH (US);

Assignee:

Presstek, Inc., Hudson, NH (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J / ; H04N / ;
U.S. Cl.
CPC ...
347234 ; 347238 ; 358300 ;
Abstract

In a digital imaging system including an array of imaging devices that image a substrate in a lateral series of adjacent longitudinal swaths, methods and apparatus for correcting device offset and hiding between regions imaged by adjacent devices. Along the direction of imaging (i.e., the dimension along which the imaging device(s) and the substrate move relative to one another during an imaging pass), adjustments take the form of compensating increases or decreases to the normal intervals between discharges to adjacent image points. Transverse to the direction of imaging, the invention compensates for imprecise device orientation and 'seam' artifacts by, first, commencing imaging with the device having the greatest offset from proper orientation, and second, as a fine adjustment, repeating at least one imaging swath to produce intentional transverse overlap between adjacent swaths.


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