The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 1995
Filed:
Nov. 15, 1993
Applicant:
Inventors:
Tung-Han Chuang, Tao-Yuan, TW;
Jing-Shin Shyu, Tung-Liu Li, Yang-Mei Chen, Tao-Yuan Hsien, TW;
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B21D / ;
U.S. Cl.
CPC ...
228157 ; 2282351 ; 228265 ; 294211 ; 72709 ; 72 62 ;
Abstract
A high gas pressure material capable of producing 50-300 psi gas pressure at forming temperature is placed in an enclosed area surrounding and sealing the blanks to be superplastically formed, without the use of argon gas. The blanks are formed under tensile stress by the internal pressure produced by the high gas pressure material. The method can be performed concurrently with diffusion bonding to obtain a metallic structure from a plurality of workpieces, and also can be used to manufacture perfectly spherical hollow bodies by a dieless method.