The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 1995
Filed:
Dec. 19, 1994
Yoshichika Iwamoto, Kumagaya, JP;
Hiroki Tateno, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure method for aligning a plurality of shot areas arranged on a substrate with predetermined exposure positions on a predetermined coordinate system in turn and transcribing, on the substrate, a pattern formed on a mask through a projection optical system comprises the steps of measuring, on a predetermined coordinate system, coordinates of a plurality of sample shot areas selected from a plurality of shot areas, determining weight coefficients corresponding to the coordinates of the sample shot areas, performing statistical calculation based on the coordinates and the weight coefficients of the measured sample shot areas and determining coordinates of the i-th shot area on the predetermined coordinate system, controlling the movement of the substrate according to the determined coordinates of the i-th shot area to set the i-th shot area at the exposure position, and adjusting the projection magnification of the projection optical system based on a parameter expressing deformation of the shot area among a plurality of parameters obtained by statistical calculation upon determining the coordinates of the shot areas.