The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 1995
Filed:
Jan. 11, 1994
Applicant:
Inventor:
Tetsuya Homma, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437195 ; 437231 ;
Abstract
A spin coated insulating film is coated selectively between wirings by treating the surface of a wiring layer with a fluorine compound gas plasma. The spin on glass film is made compact by exposing it to fluoroalkoxysilane vapor to accelerate condensation and polymerization of the spin coated materials. A silicon oxide film is formed by plasma excited CVD to form a flat interlayer insulating film. A fine mutilayer wiring structure can be readily formed by employing the above mentioned planarizing method of the interlayer insulating film.