The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 1995

Filed:

Jul. 16, 1993
Applicant:
Inventor:

Richard L Sandstrom, Encinitas, CA (US);

Assignee:

Cymer Laser Technologies, San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 59 ; 372 57 ; 372 58 ; 372 60 ;
Abstract

An excimer gas laser using a fluorine/krypton/neon gas mixture is provided with separate fluorine/krypton/neon and krypton/neon gas sources for use in replenishing the gas mixture. A bleed-down mechanism is also provided for draining a portion of the gas mixture from the excimer laser. A control mechanism controls operation of the separate fluorine/krypton/neon and krypton/neon sources and the bleed-down mechanism to selectively vary the gas mixture within the excimer laser to maintain an overall optimal laser efficiency. Preferably, the control system monitors operational parameters of the excimer laser including gain, wavelength, bandwidth and pulse rate, to determine whether the gas mixture within the excimer laser may have changed from an optimal mixture. The control system controls operation of the separate fluorine/krypton/neon and krypton/neon sources to compensate for changes in the operation parameters of the laser to thereby maintain high overall laser efficiency. Alternatively, gas replenishment is controlled subject to pre-determined empirically-based gas replenishment strategies.


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