The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 1995
Filed:
May. 28, 1992
Seiji Yamada, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A method for manufacturing a floating gate field effect transistor includes the steps of forming a plurality of first band-like insulating films over a semiconductor substrate in a parallel, spaced-apart relation and a second insulating film between the first insulating films and having a thickness smaller than that of the first insulating film, forming a plurality of first conductive layers selectively over the insulating layer and a plurality of second band-like conductive layers over the first conductive layers in a spaced-apart relation and in a direction perpendicular to the first and second insulating films, the first conductive layer having a width substantially the same as that of the second conductive layer, coating a first resist over a whole surface of a resultant structure and patterning it so as to protect a substantive source region, removing the first insulating film at those areas not covered by the first resist, removing the first resist, forming a third insulating film by a thermal oxidation, and implanting an impurity ion into an element formation area in the semiconductor substrate in a self-aligned relation to the source region of a first conductivity type and forming a first impurity region, the conductivity type of the impurity being opposite to that of the substrate.