The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1995
Filed:
Nov. 23, 1993
Katsushin Miyagi, Sagamihara, JP;
Osamu Yokokawa, Kanagawa, JP;
Yoshitaka Okada, Sagamihara, JP;
Ichiro Nagasaki, Yokohama, JP;
Akira Hashimoto, Yokohama, JP;
Tokyo Electron Kabushiki Kaisha, Tokyo, JP;
Tokyo Electron Tohoku Kabushiki Kaisha, Esashi, JP;
Cuno K.K., Yokohama, JP;
Abstract
A double cylinder shaped multilayer structural member comprising ring shaped thin plate small diameter discs and large diameter discs respectively layered via spacers is disposed in the enclosure vessel of a trap device for a vapor phase reaction apparatus. Gas from the intake opening section of the enclosure vessel is introduced into the outer side space of the multilayer structural member of the enclosure vessel, passes through the spaces between the large diameter discs and also passes through the spaces between the small diameter discs, then exits via the inner side space of the multilayer structural member from the outlet opening section of enclosure vessel to the system exterior. As a result of this construction, in comparison to conventional devices, the collection efficiency of reactive components can be increased, the equipment life extended, and maintenance frequency reduced, thereby providing a trap device for a vapor phase reaction apparatus capable of improving productivity.