The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1995
Filed:
Oct. 13, 1993
Kinya Ueno, Nirasaki, JP;
Hiroki Taniyama, Kofu, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method for washing a group of semiconductor wafers in which a first support arrangement is provided for supporting the wafer group to be immersed in a solution, with a second support carrying the wafer group to the treatment vessel. The second support can be provided, for example, in the form of a fork arrangement, and the wafer group is transferred from the second support to the first support for treatment or washing in the treatment vessel. After the wafer group is pulled from the treatment solution, the wafer group is transferred from the first support to the second support and carried outside of the treatment vessel and transferred from the second support. Water is then sprayed onto the second support by moving a water washing nozzle along support rod(s) of the second support, and by blowing a drying gas along the second support while the second support is not carrying wafers thereon, and the next wafer group can then be supported by the clean second support.