The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 1995
Filed:
Jul. 15, 1994
Edward T Ferri, Jr, Gilroy, CA (US);
J Tobin Geatz, Durham, NC (US);
Applied Chemical Solutions, Hollister, CA (US);
Abstract
The present invention provides improved method and apparatus for the transfer and delivery of very high purity chemicals for use in semiconductor production and similar processes. By employing a series of vessels arranged in parallel, a vacuum system to draw chemical from one or more bulk sources into the vessels, and a pressure system to deliver chemical under pressure from the vessels, chemicals can be easily delivered from any bulk source to one or more end-users. The use of a vacuum system to draw chemicals through sealed conduits eliminates the need for pumps which are a source of both maintenance problems and contamination in the system. Multiple vessels provide for a variety of flow options, which include continuous and uniform chemical delivery to the end-users, recirculation and regular filtration during periods of low use, and built-in redundancy to avoid system shut down if there is a component failure. Computer controlled process systems provides system flexibility and full automation.