The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1995
Filed:
Aug. 17, 1993
Sam S Chu, San Jose, CA (US);
Calvin V Ho, Berkeley, CA (US);
Catalyst Semiconductor Corp., Santa Clara, CA (US);
Abstract
Word line stress is used to narrow the distribution of threshold voltages after an erase of an array of memory cells. One embodiment of the invention provides a method for erasing an array including a standard erase technique followed by extra erase pulses to create a margin between threshold voltages of the cells and the erase verify level, then applying word line stress to narrow the distribution of threshold voltages. Another embodiment in addition includes verifying that all of the memory cells are still erased after applying word line stress and if any of the memory cells were over-stressed and are not erased, repeating the method but using less word line stress. The erase methods according to embodiments of the present invention can be implemented by an external CPU which executes an erase program or by circuitry embedded in an EEPROM.