The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1995
Filed:
Jul. 30, 1992
Applicant:
Inventors:
Kuo-Hua Lee, Lower Macungie Township, Lehigh County, PA (US);
Chen-Hua D Yu, Allentown, PA (US);
Assignee:
AT&T Corp., Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437228 ; 437235 ; 437240 ; 437947 ; 156643 ;
Abstract
A method of semiconductor integrated circuit fabrication which provides a tapered window and a smoothed dielectric. A trench is made by etching through patterned photoresist into a dielectric. Then the corners of the trench are smoothed by thermal flow. Next the trench is etched downward by RIE blanket etchback. A window with tapered sides is thereby opened to the substrate and the dielectric is simultaneously smoothed.