The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1995
Filed:
Sep. 30, 1992
Applicant:
Inventors:
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430321 ;
Abstract
In reflection mask for X ray having a predetermined pattern formed by reflecting portions comprising multilayer film and a non-reflecting portion, the reflecting portions are designed for generating a phase difference between reflected lights from opposite sides of the non-reflecting portion.
Quick Actions:
Nagata, Hiroshi. (1995). Reflection mask for x ray (U.S. Patent No. 5399448). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5399448
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile