The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 1995

Filed:

Oct. 26, 1992
Applicant:
Inventors:

Kazuhiro Kobushi, Osaka, JP;

Hironao Iwai, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 75 ; 355 53 ; 355125 ;
Abstract

An apparatus for optically forming a pattern on an object using a reticle having an original pattern to be optically projected. The apparatus is equipped with a storage circuit for storing information indicative of an exposure condition for the reticle, the storage circuit being attached to the reticle. An exposure apparatus reads out the information from the storage circuit so as to project the original pattern of the reticle on the object in accordance with the read information so that a pattern corresponding to the original pattern is formed on the object. This arrangement can automatically and accurately set the exposure condition in the exposure apparatus.


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