The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 1995

Filed:

Nov. 19, 1993
Applicant:
Inventors:

Yasuhiro Yamakage, Kyoto, JP;

Shinji Nagamachi, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
250398 ; 250309 ; 2504921 ;
Abstract

A focused ion beam apparatus which includes an ion source, an extraction electrode for extracting ion beams from the ion source, a condenser lens for focusing the ion beam, a mass spectrometer for separating a desired ion species from the extracted ion beams, a target stage adapted to support a target, deflection electrodes for deflecting the ion beam taken from the mass spectrometer, and guiding same to the target on the stage, wherein the condenser lens group includes an objective lens located immediately before the target stage, and including a decelerating field circuit for forming a decelerating field between the target stage and the outermost electrode of the objective lens, the deflection electrode having a two-stage structure consisting of a first and second group of deflection electrodes in the advancing direction of ion beam, wherein the ion beam deflected by the deflection electrodes is caused to pass through the center of the objective lens irrespective of the amount of beam deflection.


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