The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 1995
Filed:
Sep. 02, 1992
Applicant:
Inventors:
Shigeo Hashimoto, Hirakata, JP;
Shogo Kawasaki, Hirakata, JP;
Assignee:
C. Uyemura & Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156626 ; 156664 ; 156345 ;
Abstract
A process and apparatus for monitoring the etching ability of an etchant by accurately measuring the etching rate with a relatively simple arrangement. A process and apparatus for monitoring the etching rate is determined by channeling the etchant from an etching tank to a reaction column, subjecting a specimen of the same material as a metal part to be etched in practice to etching with the etchant in the reaction column, collecting hydrogen gas generated during etching of the specimen, measuring the time taken until a predetermined quantity of hydrogen gas is generated, and computing the etching rate from the measured time.