The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 1995
Filed:
Jan. 04, 1993
Applicant:
Inventors:
Hisayasu Nishino, Kawasaki, JP;
Akio Yamada, Kawasaki, JP;
Yoshihisa Oae, Kawasaki, JP;
Hiroshi Yasuda, Kawasaki, JP;
Assignee:
Fujitsu Limited, Kanagawa, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2503 / ; 2504922 ; 335210 ; 335213 ;
Abstract
A charged particle beam exposure method for deflecting a charged particle beam in a deflection system which includes electromagnetic deflection coils, includes the steps of (a) controlling the deflection system based on deflection data, and (b) generating heat at least a vicinity of the electromagnetic deflection coils so as to compensate for a change in heat generated from the electromagnetic deflection coils.
Quick Actions:
Nishino, Hisayasu. (1995). Charged particle beam exposure method and apparatus (U.S. Patent No. 5382800). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5382800
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile