The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1994
Filed:
Jul. 15, 1993
Applicant:
Inventor:
Rodney C Langley, Boise, ID (US);
Assignee:
Micron Semiconductor, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156664 ; 156665 ; 156666 ; 156638 ; 156651 ; 156667 ; 252 791 ;
Abstract
A semiconductor wafer is washed in a dilute phosphoric acid solution after the metal features have been patterned and etched, thereby removing substantially all of the residual oxide, chlorine, and/or fluorine contamination which remains on the features. This will substantially eliminate corrosion of the features. The phosphoric acid wash also substantially prevents voids from forming during a subsequent alloy step. The features can include bond pads, vias, contacts, interconnects, etc.
Langley, Rodney. (1994). Method to eliminate corrosion in conductive elements (U.S. Patent No. 5376235). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5376235
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile