The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 1994
Filed:
Jan. 29, 1993
Richard A Ayers, El Cajon, CA (US);
Richard H Wesley, Houston, TX (US);
Pulsed Power Technologies, Inc., Spring Valley, CA (US);
Abstract
Apparatus for purifying confined liquids and slurries by means of a spark discharge wherein the inner surface of the treatment vessel is designed to include a reflector section adjacent to a pair of electrodes and a concentrating section for intensifying the shock wave generated by the discharge between the electrodes. An external power source is coupled through a pulse forming network to the electrodes. The network is impedance matched to the impedance of the plasma arc generated between the electrodes to provide a high power pulse to the electrodes. The establishment of the plasma produces an extremely high pressure shock wave, u.v. radiation fringing on X-ray and electrohydraulic pressurization to alter the characteristics of the liquid therein.