The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 1994
Filed:
Jul. 09, 1993
Yasuhiro Ueda, Tokyo, JP;
Hironari Takahashi, Itami, JP;
Tokyo Electron Limited, Tokyo, JP;
Mitsubishi Electric Corporation, Tokyo, JP;
Abstract
A reduced pressure processing apparatus includes a processing vessel for performing predetermined processing to an object to be processed in a reduced pressure atmosphere, an exhaust mechanism, including a main exhaust system having a relatively high exhaust pressure and a sub-exhaust system having a relatively low exhaust pressure, for evacuating the processing vessel, and an oxygen gas concentration sensor for detecting an oxygen gas concentration in the processing vessel during exhaust performed by the sub-exhaust system. The oxygen gas concentration in the processing vessel is detected while the processing vessel is evacuated with a relatively low exhaust pressure. It is determined whether leakage is present or absent by confirming a detection value is a predetermined value or less within a predetermined period of time. When leakage is absent, the processing vessel is evacuated with the relatively high exhaust pressure. When leakage is present, the exhaust is interrupted, and necessary processing is performed. When the processing vessel is set in a desired reduced pressure state, predetermined processing is performed to the substrate.