The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 1994
Filed:
Mar. 19, 1993
Applicant:
Inventors:
Shuji Fujiwara, Tsukuba, JP;
Ryokan Yuasa, Tsukuba, JP;
Hiroaki Furukawa, Tsukuba, JP;
Masaaki Nemoto, Tsukuba, JP;
Masao Nakao, Tsukuba, JP;
Assignee:
Sanyo Electric Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
505329 ; 505728 ; 505410 ; 156628 ; 156643 ; 156644 ; 156651 ; 156656 ; 20419235 ; 252 791 ;
Abstract
An ion beam is irradiated to an oxide superconducting thin film formed on a substrate to disturb the crystal structure of the superconducting thin film and thus forming a damaged layer. The damaged layer has higher solubility in a halogen solution has a faster etching rate than other portions. Then, the superconducting thin film is etched by using a halogen solution to remove the damaged layer and form a groove at that portion. As a result, a groove of a desired form can be provided efficiently.