The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 1994
Filed:
Sep. 22, 1993
Applicant:
Inventors:
Thomas E Lewis, E. Hampstead, MA (US);
Michael T Nowak, Leominster, MA (US);
Assignee:
Presstek, Inc., Hudson, NH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430201 ; 430271 ; 430273 ;
Abstract
Novel photomask blanks and methods for producing photomasks using laser-imaging apparatus. The photomask blanks include at least one layer that absorbs laser energy and ablates in response thereto, and, where unremoved as a result of the imaging process, perform the masking function by blocking the passage of actinic radiation; and a a mechanically strong, durable and flexible substrate that is substantially transparent to actinic radiation.
Lewis, Thomas. (1994). Laser imageable photomask constructions (U.S. Patent No. 5354633). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5354633
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile