The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 1994
Filed:
Oct. 14, 1992
Applicant:
Inventors:
Laszlo Fabry, Burghausen, DE;
Manfred Grundner, Burghausen, DE;
Dieter Graef, Burghausen, DE;
Susanne Bauer-Mayer, Burghausen, DE;
Peter John, Burghausen, DE;
Assignee:
Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH, Burghausen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437238 ; 437974 ; 148 33 ;
Abstract
A process for producing silicon wafers which have a storage-stable surface and which can be thermally oxidized directly, that is to say, without a prior HF immersion bath, and without the addition of halogen-containing gases, it being possible to achieve an equal or better oxidation result than that achieved by including these measures.