The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 1994

Filed:

Oct. 13, 1992
Applicant:
Inventors:

Yusuke Yajima, Kokubunji, JP;

Masakazu Ichikawa, Tokyo, JP;

Hiroyuki Shinada, Chofu, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250311 ; 250397 ;
Abstract

An electron microscopic image observing method and an apparatus for carrying out the same enables the observation of an electron microscopic image of a specimen by irradiating the specimen with an electron beam and detecting the electron beam after it has transmitted through the specimen. The electron beam transmitted through the specimen is deflected so that the deflection thereof varies with time, and is allowed to pass through an aperture only when the deflection thereof is within a predetermined range of deflection, whereby the electron beam transmitted through the specimen and passed through the aperture is then detected. Thus, the electron microscopic image observing method and the apparatus for carrying out the same enables the observation of time-resolved electron microscopic images of a specimen having internal physical properties varying with time.


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