The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 1994
Filed:
Dec. 21, 1992
Applicant:
Inventors:
Alan L Sidman, Wellesley, MA (US);
Susan K Fung, Worcester, MA (US);
Assignee:
Digital Equipment Corp., Maynard, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430322 ; 430273 ; 430325 ; 430313 ; 430327 ;
Abstract
A microlithographic resist patterning process which allows generation of very thick, vertically-walled resist patterns which allow for subsequent deposition or etching operations can produce high recording density magnetic thin film heads and other devices requiring high aspect ratios.