The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 1994

Filed:

Apr. 05, 1993
Applicant:
Inventors:

Teppei Yamashita, Ise, JP;

Masanao Murata, Ise, JP;

Tsuyoshi Tanaka, Ise, JP;

Teruya Morita, Ise, JP;

Hitoshi Kawano, Ise, JP;

Atsushi Okuno, Ise, JP;

Masanori Tsuda, Ise, JP;

Mitsuhiro Hayashi, Ise, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65B / ; H01L / ;
U.S. Cl.
CPC ...
2062131 ; 206454 ; 211 41 ; 118500 ; 141 98 ; 141 67 ; 414935 ;
Abstract

A wafer storing, closed container for use in a clean room of a semiconductor manufacturing system is provided with an attached inert gas tank so as to eliminate the need to convey the container to an inert gas purge station to supplement the inert gas supply in the container due to leakage. A gas passageway is formed in a body of the container in such a manner that one end thereof is open inside the container. The other end is open outside the container. The portable inert gas tank is detachably connected to the other end of the gas passageway so as to automatically supplement the container with the inert gas.

Published as:
EP0565001A1; JPH05286567A; KR930022515A; US5320218A; EP0565001B1; DE69304385D1; DE69304385T2; KR100273842B1; JP3191392B2;

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